Home/Publications/Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
Photo: Electro Optics Mircea Guina, Professor of Optoelectronics (Semiconductor Technology) at Tampere University, has been named to the Photonics100 list…
No Comments yet!